Investigation of Optical and Structure Properties for Nano NiO Prepared by induced Plasma Technique

Abstract

In the current study, NiO nanoparticles were made from bulk structure using the induced plasma process and various bombardment periods. These nanoparticles were created as thin layers on various thicknesses of glass substrates (prepared at different times of shotting). After that, they were analyzed with an x-ray spectrum, scanning electron microscope, atomic force microscope, and UV-visible spectrophotometer. When the optical constants and characteristics were examined, the film' energy gaps ranged from 1.85 eV to 2.1 eV depending on the bombardment periods. The AFM and SEM examination tools clearly reveal a structural change where the roughness varies with bombardment time due to the variation in the diameter of the nanoparticles. Finally, layers are completely crystalline by the x-ray spectrum